ITESO's Nanotechnology Lab is a space dedicated to the teaching, research, innovation, technological transfer and scientific research of nanoscience and nanotechnology. It has cutting-edge infrastructure, equipment and technology, and aspires to excellence in carrying out processes that meet the quality standards required for teaching, scientific research and services to industry.
The lab is divided into three main sections: microscopy, deposition, and chemical processes and spectroscopy, all equipped with the infrastructure needed for the proper manipulation and preparation of samples.
The microscopy section has an atomic force microscope (AFM) and a scanning electron microscope (SEM) with built-in X-ray spectrometry (XDS), that enable users to characterize topographies, magnetic and electrical properties, and the chemical composition of a sample. It also has a sample preparation room with nitrogen pistols, and ultrasound and thermal agitation equipment.
The deposition section contains an evaporator and a four-target sputtering (three DCs for conductors and one RF for non-conductors) for manufacturing thin films and other nanosystems and microsystems.
Finally, the chemical process and spectrometry section is equipped with an X-ray electronic photoemission spectrometer (XPS) to measure the chemical composition of a sample's surface layers, an electric-arc nanoparticle
generator, graphite-coating equipment and an industrial sputtering for samples with larger proportions. It also has a sample-preparation space with ultrasound, thermal agitation, analytical balance and nitrogen pistol services.
The main apparatuses available for use are:
I) Characterization equipment:
1. Scanning electron microscopy (SEM) with energy-dispersive X-ray spectrometry (EDS).
2. Atomic force microscopy (AFM).
3. X-ray photoelectron spectrometry (XPS) with electron source for Auger and depth profiling potential.
II) Synthesis and manufacturing equipment:
1. Sputter deposition, with three DC targets and one RF target.
2. Deposition by evaporation.
3. Industrial sputter deposition (chamber with capacity for samples measuring up to 10 inches in diameter by one inch in height).
4. Electric-arc discharge for generating nanostructured materials.
5. Equipment for coating with diamond-crystal structure graphite for metals.
Location of the microscopy and film-deposit rooms:
J Building, ground floor
Hours: 9:30 a.m. to 2:00 p.m., and 3:00 to 5:40 p.m.
Location of XPS and chemical process rooms:
T Building, second floor
Hours: 9:00 a.m. to 2:00 p.m., and 4:00 to 7:00 p.m.
Professor in Charge:
José Bernardo Cotero Ochoa
Tel. 36693434 Ext. 3503